<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="6.x">Drupal-Biblio</source-app><ref-type>47</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">J.S. Chan</style></author><author><style face="normal" font="default" size="100%">T.C. Fu</style></author><author><style face="normal" font="default" size="100%">N.W. Cheung</style></author><author><style face="normal" font="default" size="100%">Jennifer T. Ross</style></author><author><style face="normal" font="default" size="100%">Nathan Newman</style></author><author><style face="normal" font="default" size="100%">Michael D. Rubin</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Comparison of AIN Films Grown by RF at Magnetron Sputtering and Ion-Assisted Molecular Beam Epitaxy</style></title><secondary-title><style face="normal" font="default" size="100%">MRS Proceedings</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">1994</style></year></dates><urls><related-urls><url><style face="normal" font="default" size="100%">http://eetd.lbl.gov/sites/all/files/publications/35660.pdf</style></url></related-urls></urls><volume><style face="normal" font="default" size="100%">300</style></volume><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;Crystalline aluminum nitride (AlN) thin films were formed on various substrates by using RF magnetron sputtering of an Al target in a nitrogen plasma and also by ion-assisted molecular beam epitaxy (IAMBE). Basal-oriented AlN/(111) Si showed a degradation of crystallinity with increased substrate temperature from 550 to 770 degrees C, while the crystallinity of AlN/(0001) Al2O3 samples improved from 700 to 850 degrees C. The optical absorption characteristics of the AlN/(0001) Al2O3 films as grown by both deposition methods revealed a decrease in sub-band gap absorption with increased substrate temperature.&lt;/p&gt;</style></abstract><call-num><style face="normal" font="default" size="100%">LBL-35660</style></call-num><custom1><style face="normal" font="default" size="100%">&lt;p&gt;Windows and Daylighting Group&lt;/p&gt;</style></custom1><custom2><style face="normal" font="default" size="100%">LBL-35660</style></custom2></record></records></xml>