Early phase laser induced plasma diagnostics and mass removal during single-pulse laser ablation of silicon

TitleEarly phase laser induced plasma diagnostics and mass removal during single-pulse laser ablation of silicon
Publication TypeJournal Article
Year of Publication1999
AuthorsLiu, H. C., Xianglei Mao, Jong H. Yoo, and Richard E. Russo
Secondary TitleSpectrochimica Acta Part B-Atomic Spectroscopy
Volume54
Pagination1607-1624
Publication Languageeng
Accession Number109
Keywords266 nm, ablation, c, ca, crater, critical temperature, density, deposition, diagnostic, diagnostics, e, electron, electron number densities, electron number density, electron-density, england, induced plasma, inverse bremsstrahlung, ionization, irradiance, laser, laser ablation, laser induced plasma, laser induced plasma spectroscopy, laser-ablation, laser-induced plasma, laser-induced plasmas, mass, mass removal, measurement, measurements, mechanism, mechanisms, nd:yag, nd:yag laser, number, number density, parameters, phase, plasma, plasma diagnostic, plasma diagnostics, plasma temperature, plasmas, region, removal, science, self-focusing, silicon, spectroscopy, temperature, threshold, time, usa, via, volume
Abstract

The electron number density and temperature during the early phase (< 300 ns) of laser-induced plasmas from silicon using a 266-nm, 3-ns Nd:YAG laser were deduced via spectroscopic methods. These parameters were measured as a function of delay time vs. irradiance in the range of 2-80 GW/cm(2), and compared with crater volume measurements. A dramatic change in plasma characteristics (electron number density, temperature, and degree of ionization) as well as a sharp increase of mass removal was observed when the irradiance was increased beyond a threshold of 20 GW/cm(2). Possible mechanisms such as inverse bremsstrahlung and self-regulation were used to describe these data in the low irradiance region. Laser self-focusing and critical temperature are discussed to explain the dramatic changes after the irradiance reaches the threshold. (C) 1999 Elsevier Science B.V. All rights reserved

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LBNL Report NumberLBNL-43861
Citation Key14371